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Invited Speakers
 
Stephen Hersee            The Growth of GaN Nanowires and their Electrical and Optical Characteristics University of New Mexico, USA
Ian Ferguson           
MOVPE growth of transition-metal doped GaN and ZnO for spintronic applications 

 

Georgia Institute of Technology,
Atlanta, USA

 

Yasuyuki  Kobayashi
Boron Nitride Grown by MOVPE NTT Basic Research Laboratories,
Atsugi, Japan
 Alois KrostHetero- and Homoepitaxy of ZnO by MOVPE    

 

Otto-von-Guericke-University Magdeburg, Germany

 

 Nicolas Grandjean      
GaN based vertical surface emitting devices                                 
 EPFL, Lausanne, Switzerland

 

Trevor Martin

 

GaN materials for microwave devices : a review of the requirements, challenges and progress
 Qinetiq, Great Britain
Yasuhiko Arakawa

Advances in MOVPE-grown quantum dots for semiconductor lasers at telecom wavelength 

 University of Tokyo, Japan

 

Thomas Kuech                                  

 

MOVPE growth of Antimonide-based alloy materials for long wavelength applications

 

 

University of Wisconsin-Madison, USA

Andrei Sirenko

 

High angular resolution microdiffraction analysis
for complex micro and nanostructures using synchrotron radiation

 

 New Jersey Institute of Technology,
Newark, USA
Mark A Stan  Very High Efficiency Triple Junction Solar Cells by MOVPE Emcore  Photovoltaics, USA
Nicole Proust  

 

Heath and Safety at work : device epitaxy

 

 Thales Research & Technology, Palaiseau, France
Hiroo Yonezu

 III-V epitaxy on Si for photonics applications 

  Toyohashi University of Technology, Japan
Chih-Chung Yang

 

Nitride-based white-light light-emitting diodes

 

 National Taiwan University, Taiwan 
Stuart J C IrvineMOVCD of thin film photovoltaic solar cells – next generation production technology? OpTIC Technium, North Wales, UK